PROSES FOTOKATALITIK DENGAN KATALIS TiO2 MENGGUNAKAN REAKTOR MULTIPLATE UNTUK MENYISIHKAN GAS NOX
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Abstract
Photocatalytic using UV light and semiconductor particle is an alternative solution for removal NOx. This study is about the removal of NOx originated from pure gas with photocatalytic process using TiO2, where the TiO2 are placed in a continuous flow multiplate reactor and beamed by UV light. This study examined the effect of the plates spacing variation, initial concentration of NOx, and the use of UV light and catalyzes. NOx analyzed using Horiba NOx Analyzer with 0.8 lt/min flow rate. The result showed that photocatalytic process using TiO2 depend on UV light intensity, the plates spacing variation and initial concentration of NOx. Removal efficiency of photocatalytic process using TiO2 + 62 % at the optimal condition.
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